0040-49386 AMAT

Description: The AMAT 0040-49386 is identified as a critical component, likely a Heater Assembly designed for use in AMAT’s advanced semiconductor wafer processing equipment. This heater plays a vital role in maintaining precise temperature control during various stages of wafer fabrication, ensuring optimal process conditions and uniformity. Application Scenarios: Imagine a cutting-edge thin-film deposition process…

0040-82011 AMAT

Description: The AMAT 0040-82011 is a sophisticated ESC (Electrostatic Chuck) assembly, a critical component in AMAT’s advanced semiconductor wafer processing equipment. This precision-engineered chuck securely holds silicon wafers during various fabrication processes using electrostatic force, ensuring accurate positioning and thermal contact for optimal processing uniformity. Application Scenarios: Consider a state-of-the-art plasma etching process in a…

0022-15836 AMAT

Description: The AMAT 0022-15836 is a critical component, identified as a Faceplate designed for Low-k Xtra Row Extending applications within AMAT’s 300mm wafer processing equipment. This specialized part plays a vital role in ensuring precise and controlled processing environments for advanced semiconductor manufacturing. Application Scenarios: Consider a high-volume semiconductor fabrication line producing next-generation microprocessors. During…

0037183-004/003 MEASUREMENT

Description: The 0037183-004/003 from MEASUREMENT SPECIALTIES (now TE Connectivity) is a high-precision pressure transducer, designed for accurate and reliable pressure measurements in demanding industrial and OEM applications. This robust sensor delivers excellent performance and stability across a wide range of pressure and temperature conditions. Application Scenarios: Consider an advanced hydraulic control system used in heavy…

0021-84842 AMAT

Description: The AMAT 0021-84842 is a high-performance servo motor, engineered for precise motion control in demanding industrial automation applications. This robust motor delivers exceptional torque and responsiveness, ensuring accurate and reliable operation in critical processes. Application Scenarios: Imagine a leading semiconductor manufacturing facility facing increasing demands for wafer processing precision. In their advanced etching equipment,…

0021-53986 AMAT

Description: The 0021-53986 AMAT is identified as a Liner, Upper, ALN, ENCORE 2, designed for 300mm wafer processing equipment manufactured by Applied Materials (AMAT). This upper liner, made of Aluminum Nitride (ALN), is a crucial component within the process chamber of the ENCORE 2 platform. Liners serve to protect the chamber walls from the harsh…

0021-53663 AMAT

Description: The 0021-53663 AMAT is a CRITICAL INSERT, SLIT VALVE, ACP ALUM, specifically designed for 300mm wafer processing equipment manufactured by Applied Materials (AMAT). This component is a vital part of the slit valve mechanism within the process chamber. Slit valves are crucial for isolating different sections of the vacuum system, allowing for wafer transfer…

0021-42136 AMAT

Description: The 0021-42136 AMAT is identified as a FACEPLATE, LOWK XTRA ROW EXTENDING FLO, designed for 300mm wafer processing equipment manufactured by Applied Materials (AMAT). This faceplate is a key component, likely part of a gas distribution system (such as a showerhead) within a plasma processing chamber. Its design, featuring “LOWK XTRA ROW EXTENDING FLO,”…

0021-33621 AMAT

Description: The 0021-33621 AMAT is identified as a SHLD MIDDLE MATRIX CU ENDURA 2, likely a middle shield component made of Copper (Cu) and designed for the ENDURA 2 platform from Applied Materials (AMAT). This shield is a crucial part within AMAT’s Physical Vapor Deposition (PVD) systems, specifically used in the ENDURA 2 chamber for…

0021-16781 AMAT

Description: The 0021-16781 AMAT is identified as a SHIELD, UPPER, 300MM, REV 2.0 SIP CU from Applied Materials (AMAT). This is a crucial component within AMAT’s Physical Vapor Deposition (PVD) systems, specifically designed for 300mm wafer processing utilizing SIP (Single In-situ Plasma) Copper technology. This upper shield plays a vital role in protecting specific areas…