Based on the available information, the AMAT 0010-27983 is a 300MM MCA E-CHUCK ESC HEATER, also referred to as a PIB HTB2 MCA ESC Heater. This is a critical component used in Applied Materials (AMAT) semiconductor manufacturing equipment for controlling the temperature of the electrostatic chuck (ESC) that holds 300mm wafers during processing.
Detailed Parameter Table
| Parameter name | Parameter value |
|---|---|
| Product model | 0010-27983 |
| Manufacturer | Applied Materials (AMAT) |
| Product category | 300mm MCA E-Chuck ESC Heater |
| Application | Semiconductor Manufacturing Equipment (Wafer Processing) |
| Wafer Size Compatibility | 300mm |
| Specific Designation | MCA E-Chuck ESC Heater, PIB HTB2 MCA ESC Heater |
| Function | Heats and regulates the temperature of the electrostatic chuck (ESC) during wafer processing |
| Heating Element | Ceramic (based on one listing) |
| Temperature Range | 0-200 °C (based on one listing) |
| Mounting Type | Flange-mounted (based on one listing) |
| Compatibility | Applied Materials 300mm wafer processing systems (e.g., Endura) |
Product Introduction
The AMAT 0010-27983 is a specialized 300MM MCA E-CHUCK ESC HEATER, also known as a PIB HTB2 MCA ESC Heater, designed by Applied Materials (AMAT) for precise temperature control of electrostatic chucks (ESCs) in semiconductor manufacturing equipment that processes 300mm silicon wafers. This AMAT 0010-27983 plays a crucial role in maintaining the desired wafer temperature during various critical steps in semiconductor fabrication, such as deposition, etching, and other surface treatments. Accurate temperature control is essential for ensuring consistent wafer quality and process uniformity. As a vital component in the wafer handling and processing system, the AMAT 0010-27983 contributes significantly to the overall efficiency and yield of advanced semiconductor manufacturing. Its technical positioning emphasizes reliable and uniform heating, contributing to the precise thermal environment required for optimal process outcomes.
Core Advantages and Technical Highlights
The AMAT 0010-27983 300MM MCA E-CHUCK ESC HEATER offers several key advantages for precise wafer temperature control:
Precise and Uniform Heating: The 0010-27983 is designed to provide accurate and consistent heating to the electrostatic chuck, ensuring uniform temperature distribution across the 300mm wafer surface. This uniformity is critical for consistent processing results.
High Temperature Capability: With a potential temperature range of 0-200 °C (based on one listing), the AMAT 0010-27983 can meet the thermal requirements of various semiconductor manufacturing processes. The “HTB2” designation also suggests high-temperature capability.
Long Service Life: Built with quality materials like ceramic heating elements (in some variants), the AMAT 0010-27983 is designed for long-term reliability in demanding semiconductor manufacturing environments.
Seamless AMAT System Integration: As a genuine AMAT part, the AMAT 0010-27983 ensures seamless integration and compatibility with Applied Materials’ 300mm wafer processing equipment, guaranteeing optimal performance and reliability of the ESC temperature control system.
Contributes to Wafer Quality: Precise temperature control provided by the 0010-27983 is crucial for achieving the desired film properties, etch rates, and other process characteristics that directly impact the quality of the semiconductor devices produced.
