Description: The 0021-03721 AMAT is identified as a HALOGEN RESISTANT XE REFLECTOR PLATE, specifically designed for use in Applied Materials (AMAT) Rapid Thermal Processing (RTP) chambers that utilize Xenon (Xe) lamps for heating. This reflector plate is a critical component for directing and focusing the intense light energy from the Xe lamps onto the semiconductor wafer, ensuring rapid and uniform heating during RTP cycles. The “HALOGEN RESISTANT” designation indicates its ability to withstand the corrosive environment often present within these lamp housings.
Application Scenarios: In semiconductor manufacturing, RTP is a crucial process for various steps like annealing, oxidation, and silicidation, requiring rapid and precise temperature control. Within an AMAT RTP chamber equipped with Xe lamps, the 0021-03721 AMAT Reflector Plate plays a vital role. It is strategically positioned behind or around the Xe lamp to capture and redirect the emitted light towards the silicon wafer. The reflector’s shape and surface finish are engineered to ensure uniform energy distribution across the wafer surface, leading to consistent thermal processing. The halogen resistance of the plate is essential for maintaining its reflectivity and performance over time, despite exposure to halogen gases within the lamp housing. Efficient and uniform heating provided by a properly functioning reflector plate like the 0021-03721 is paramount for achieving high-quality and consistent RTP results, ultimately impacting device performance and yield.
Parameter
| Main Parameters | Value/Description |
|---|---|
| Product Model | 0021-03721 |
| Manufacturer | Applied Materials (AMAT) |
| Product Category | Reflector Plate |
| Application | Rapid Thermal Processing (RTP) Equipment |
| Lamp Type Compatibility | Xenon (Xe) Lamps |
| Feature | Halogen Resistant |
| Wafer Size Compatibility | Likely 200mm (based on some listings) |
| Condition | New or Used (commonly found on the market) |
| Associated Terms | Chamber Reflector Plate, XE Reflector |
| Material | Likely a specialized material with high reflectivity and halogen resistance |
| Mounting | Integrated within the RTP lamp housing/chamber |
Technical Principles and Innovative Values:
- Innovation Point 1: Optimized Light Reflection: The 0021-03721 AMAT is designed with a specific parabolic or elliptical shape and a highly reflective surface coating to efficiently focus the light energy from the Xe lamp onto the wafer, maximizing heating efficiency.
- Innovation Point 2: Halogen Resistance: The use of halogen-resistant materials ensures that the reflector plate can withstand the corrosive environment within the Xe lamp housing, maintaining its reflectivity and extending its lifespan.
- Innovation Point 3: Uniform Energy Distribution: The geometry of the reflector is engineered to provide a uniform distribution of light energy across the wafer surface, crucial for achieving consistent thermal processing during RTP.
- Innovation Point 4: Integration within AMAT RTP Systems: As a component designed by Applied Materials, the 0021-03721 ensures seamless integration and optimal performance within their specific RTP chamber designs.
Application Cases and Industry Value: In a semiconductor manufacturing facility utilizing AMAT RTP systems for annealing тонкие пленки (thin films), achieving rapid and uniform heating of 200mm wafers is critical for the desired material properties. The Applied Materials 0021-03721 Halogen Resistant XE Reflector Plate ensures that the intense light from the Xe lamps is efficiently directed and evenly distributed across the wafer surface, leading to consistent annealing results. The halogen resistance of the reflector maintains its performance over numerous RTP cycles, ensuring long-term reliability and contributing to stable and high-yield manufacturing processes.
Related Product Combination Solutions:
- Applied Materials XE Lamps: The high-intensity Xenon lamps that are used in conjunction with the 0021-03721 reflector plate to provide the rapid heating in the RTP chamber.
- Applied Materials RTP Chamber Assembly: The complete RTP chamber that houses the lamps, reflectors, wafer chuck, and temperature control sensors.
- Applied Materials Temperature Controllers: Precisely regulate the power to the Xe lamps based on temperature feedback to achieve the desired thermal profile during RTP.
- Pyrometers and Temperature Sensors: Used to monitor the temperature of the wafer during the RTP process, providing feedback for the control system and ensuring process accuracy.
- Quartz Windows for RTP Chambers: Transparent windows that allow the light from the Xe lamps to reach the wafer while maintaining the controlled atmosphere within the chamber.
- Wafer Handling Robots for RTP Systems: Precisely load and unload wafers into the RTP chamber, ensuring proper positioning for uniform heating by the reflected light.
- Cooling Systems for RTP Lamps: Manage the heat generated by the high-power Xe lamps to ensure their stable operation and prolong their lifespan, which can also affect the performance of the reflector.
- Gas Delivery Systems for RTP Chambers: Control the flow of gases (e.g., nitrogen, argon, oxygen) into the RTP chamber for specific thermal processes.
