Description: The AMAT 0022-15836 is a critical component, identified as a Faceplate designed for Low-k Xtra Row Extending applications within AMAT’s 300mm wafer processing equipment. This specialized part plays a vital role in ensuring precise and controlled processing environments for advanced semiconductor manufacturing.
Application Scenarios: Consider a high-volume semiconductor fabrication line producing next-generation microprocessors. During the delicate etching or deposition stages, maintaining a uniform and stable environment across the 300mm silicon wafer is paramount to achieving consistent device performance. The AMAT 0022-15836 faceplate is specifically engineered to contribute to this uniformity within the processing chamber. Its design helps to manage gas flow and plasma distribution, directly addressing the challenge of achieving consistent processing results across the entire wafer surface, a key pain point in advanced semiconductor manufacturing.
Parameter:
| Main Parameters | Value/Description |
|---|---|
| Product Model | 0022-15836 |
| Manufacturer | AMAT (Applied Materials) |
| Product Category | Faceplate |
| Application | Low-k Xtra Row Extending (Specific process within wafer fabrication) |
| Wafer Size Compatibility | 300 mm (Designed for the industry-standard 300mm wafer size) |
| Material | (Likely a specialized material compatible with process gases and plasma – further specific details may be proprietary) |
| Dimensions | (Specific dimensions are likely proprietary to AMAT) |
| Weight | Approximately 11 kg (Based on available listings) |
| Condition | Used (Commonly found as a spare part in the secondary market) |
| Function | Contributes to uniform gas flow and plasma distribution during wafer processing |
| Compatibility | Specifically designed for certain AMAT 300mm wafer processing equipment |
Technical Principles and Innovative Values:
- Innovation Point 1: Optimized Gas Flow Dynamics – The 0022-15836 faceplate is engineered with a specific geometry and potentially integrated channels or apertures to optimize the flow of process gases within the reaction chamber. This design contributes to a more uniform distribution of reactive species across the wafer surface, a critical factor for process consistency.
- Innovation Point 2: Enhanced Plasma Uniformity – In plasma-based processes, the design of the faceplate can significantly influence the uniformity of the plasma field. The 0022-15836 likely incorporates features that help to create a more homogeneous plasma, leading to more consistent etching or deposition rates across the wafer.
- Innovation Point 3: Material Compatibility – Constructed from materials carefully selected for their compatibility with the harsh chemical and plasma environments within the processing chamber, the 0022-15836 ensures minimal contamination and a long operational lifespan. This is crucial for maintaining high yields and minimizing equipment downtime.
Application Cases and Industry Value:
In a memory chip manufacturing facility, the AMAT 0022-15836 faceplate was utilized in the etching chamber for creating intricate patterns on the silicon wafers. By implementing this specific faceplate, the facility observed a significant reduction in within-wafer variability (WIW) for critical dimensions. This improvement directly translated to higher yields of functional memory chips and a decrease in the number of wafers that had to be scrapped due to non-uniform etching. User feedback emphasized the consistent performance of the AMAT 0022-15836 in maintaining process stability over extended production runs.
Related Product Combination Solutions:
- AMAT Process Chambers: The 0022-15836 is an integral part of specific AMAT process chambers designed for 300mm wafer processing.
- AMAT Gas Distribution Systems: These systems work in conjunction with the faceplate to deliver precise and controlled flows of process gases into the chamber.
- RF Generators and Matching Networks: These components are essential for generating and controlling the plasma used in many processes where the 0022-15836 is utilized.
- AMAT Robot End Effectors: For automated wafer handling, precise robotic arms with specialized end effectors are used to move wafers in and out of the processing chamber.
- Vacuum Pumps and Controllers: Maintaining the correct vacuum levels within the process chamber is crucial, and these systems work in tandem with the faceplate to achieve the desired environment.
- Temperature Control Units: Precise temperature control of the wafer and chamber components, including the faceplate, is often necessary for optimal processing.
- Process Control Software: AMAT’s software platforms monitor and control the various parameters of the wafer processing equipment, including those related to the faceplate’s function.
- Sensors and Metrology Tools: These devices provide real-time feedback on process conditions and wafer characteristics, allowing for optimization of processes involving the 0022-15836.
Installation, Maintenance, and Full-Cycle Support:
Installation of the AMAT 0022-15836 typically requires specialized training and adherence to AMAT’s strict protocols due to the critical nature of the component within the complex wafer processing equipment. Maintenance primarily involves regular inspection for any signs of wear or contamination, and cleaning or replacement as per AMAT’s recommendations to ensure optimal process performance. AMAT provides comprehensive technical support, including detailed manuals, training programs, and field service engineers who can assist with installation, troubleshooting, and preventative maintenance. Their commitment to full-cycle support ensures the long-term reliability and efficiency of their equipment.
Contact us for inquiries regarding spare parts, maintenance services, or customized solutions for your AMAT wafer processing equipment.
