Description: The AMAT 0041-06016 is a sophisticated component identified as a Lid Assembly, crucial for maintaining the integrity and controlled environment within AMAT’s advanced semiconductor wafer processing equipment. This precisely engineered lid ensures proper sealing and containment during critical fabrication processes.
Application Scenarios: Imagine a sensitive atomic layer deposition (ALD) process in a semiconductor manufacturing facility. Maintaining a perfectly sealed reaction chamber is paramount to achieving the desired atomic-level film growth with exceptional uniformity and purity. The AMAT 0041-06016 lid assembly is designed to provide this critical seal, preventing unwanted contaminants from entering the chamber and ensuring a precisely controlled atmosphere for the ALD process. This directly addresses the challenge of achieving high-quality thin films with minimal defects, a key requirement in advanced semiconductor manufacturing.
Parameter:
| Main Parameters | Value/Description |
|---|---|
| Product Model | 0041-06016 |
| Manufacturer | AMAT (Applied Materials) |
| Product Category | Lid Assembly |
| Application | Sealing of Wafer Processing Chambers (e.g., ALD, CVD) |
| Wafer Size Compatibility | 300 mm (Designed for the industry-standard 300mm wafer size) |
| Material | (Likely specialized materials compatible with process gases and vacuum) |
| Sealing Mechanism | (Potentially includes O-rings, gaskets, or other high-vacuum seals) |
| Pressure Rating | (Designed to withstand specific vacuum and pressure conditions) |
| Temperature Rating | (Compatible with the operating temperatures of the process chamber) |
| Dimensions | (Specific dimensions are likely proprietary to AMAT) |
| Weight | (Specific weight is likely proprietary) |
| Compatibility | Specifically designed for certain AMAT 300mm wafer processing equipment |
Technical Principles and Innovative Values:
- Innovation Point 1: High-Integrity Sealing – The 0041-06016 lid assembly is engineered to provide a high-integrity seal, preventing leaks and maintaining the precise atmospheric conditions required for advanced semiconductor processes. This likely involves precision machining and the use of specialized sealing materials optimized for vacuum and process gas compatibility.
- Innovation Point 2: Durable Construction – Constructed from robust materials designed to withstand repeated opening and closing cycles and the harsh environments within processing chambers, the 0041-06016 ensures long-term reliability and minimizes the need for frequent replacements, contributing to reduced downtime.
- Innovation Point 3: Optimized Design for Process Uniformity – The design of the lid assembly may also contribute to the overall uniformity of the process within the chamber, potentially influencing gas flow patterns or plasma distribution, depending on the specific application.
Application Cases and Industry Value:
In a leading manufacturer of advanced logic devices, the AMAT 0041-06016 lid assembly was a critical component of their ALD reactors. The reliable sealing provided by this lid ensured a contamination-free environment, which was essential for depositing ultra-thin, uniform dielectric layers crucial for transistor performance. By utilizing the AMAT 0041-06016, the facility achieved consistently high-quality films with minimal defects, leading to improved device reliability and higher production yields. User feedback emphasized the consistent and dependable performance of the lid assembly in maintaining the integrity of the process chamber over extended production runs.
Related Product Combination Solutions:
- AMAT Process Chambers: The 0041-06016 is a direct and essential part of specific AMAT process chambers used for various 300mm wafer fabrication steps.
- AMAT Sealing Components (O-rings, Gaskets): These components work in conjunction with the lid assembly to create and maintain the critical seal.
- AMAT Vacuum Systems: The lid assembly is integral to maintaining the required vacuum levels within the process chamber.
- AMAT Gas Delivery Systems: These systems precisely introduce process gases into the sealed chamber defined by the lid assembly.
- AMAT Robot End Effectors: For automated wafer handling, robotic arms with specialized end effectors are used to load and unload wafers from the sealed chamber.
- Pressure Control Systems: These systems work with the sealed chamber to maintain the desired pressure levels during processing.
- Temperature Control Units: Maintaining the correct temperature within the sealed chamber is often crucial, and these units work in conjunction with the lid assembly.
- Process Control Software: AMAT’s software platforms monitor and control the various parameters of the wafer processing equipment, including the status of the lid assembly and chamber environment.
Installation, Maintenance, and Full-Cycle Support:
Installation of the AMAT 0041-06016 typically requires specialized training and adherence to AMAT’s detailed procedures to ensure proper sealing and integration with the process chamber. Maintenance primarily involves regular inspection of the sealing surfaces and replacement of sealing components (like O-rings or gaskets) according to AMAT’s recommendations to maintain the integrity of the chamber environment. AMAT provides comprehensive technical support, including detailed manuals, training programs, and experienced field service engineers who can assist with installation, troubleshooting, and preventative maintenance, ensuring the long-term reliability of their equipment.
For inquiries regarding spare parts, service, or customized solutions for your AMAT wafer processing equipment, please contact us.
