A detailed search for the LAM 660-072825-200 reveals that it is not a standalone part but rather a part number for a MKS/ENI LVF3527A 27MHz RF Generator. This component is a high-performance RF (Radio Frequency) power supply unit, a critical piece of equipment used in advanced semiconductor manufacturing processes. The 660-072825-200 designation is a Lam Research part number, indicating it is an OEM component used within their tools, such as plasma etching and deposition systems.

Product Description for LAM 660-072825-200

Description: The LAM 660-072825-200 is a high-performance 27MHz RF Generator, manufactured by MKS Instruments/ENI, for use in Lam Research’s semiconductor fabrication equipment. This RF generator is an essential component for plasma-based processes like etching and deposition. It delivers a stable and precisely controlled high-frequency power source to create and maintain plasma within a process chamber, which is a key requirement for manufacturing modern microchips.

Application Scenarios: In a semiconductor fabrication plant, a critical plasma etching tool is used to precisely remove material from a silicon wafer. The consistency and uniformity of this process are directly dependent on the stability of the plasma. The RF generator is the heart of this system, converting input AC power into a high-frequency RF signal that ionizes the process gases to create the plasma. An older generator was experiencing power stability issues, leading to inconsistent etch rates and a low yield of good wafers. By replacing it with the LAM 660-072825-200 (MKS LVF3527A), the facility restored the precision of the etching process. The generator’s advanced control and stable 27MHz output ensured a repeatable plasma, which in turn improved the uniformity and quality of the etched wafers, significantly increasing the plant’s production yield.

Parameter:

Main Parameters Value/Description Product Model: 660-072825-200 (MKS LVF3527A-10B-05) Manufacturer: LAM Research (OEM from MKS/ENI) Product Category: RF Generator Operating Frequency: 27 MHz, a standard frequency for semiconductor plasma applications. Output Power: 3500 Watts, providing sufficient power for high-density plasma processes. Input Power: 208V AC, 3-phase, 30A, 50/60 Hz, suitable for industrial power grids. Cooling: Air and water-cooled, for robust thermal management in demanding environments. Communication: RS-232C, remote panel, and analog I/O, for seamless integration with a system controller. Application: Plasma etching, Chemical Vapor Deposition (CVD), and sputtering. Weight: Approximately 32 kg (70 lbs), indicating a heavy-duty, industrial-grade design.

Technical Principles and Innovative Values:

• Innovation Point 1: Stable, Repeatable RF Power: The LAM 660-072825-200 (MKS LVF3527A) is renowned for its exceptional power stability and repeatability. In semiconductor manufacturing, a mere 0.1% drift in power can lead to a significant change in the process outcome. This generator is engineered to maintain power output with less than a ±0.05% change, ensuring that every wafer is processed with the same precision, which is critical for consistent yield.
• Innovation Point 2: Impedance Matching for Optimal Power Transfer: To achieve maximum process efficiency, the RF generator must be coupled with an impedance matching network. The 660-072825-200 is designed to work in synergy with a matching network to minimize reflected power (typically less than 10W). This ensures that virtually all the generated RF energy is delivered to the plasma, creating a stable and efficient process.
• Innovation Point 3: Integrated Diagnostics and Control: The generator includes a communication interface that allows it to be remotely controlled and monitored by the tool’s main processor. This enables real-time adjustments of power levels and provides diagnostic data, such as forward and reflected power, which is essential for process control and troubleshooting. This integrated control system is a key feature that simplifies the automation of complex fabrication steps.

Application Cases and Industry Value:

In a facility that produces advanced microprocessors, the plasma etching step is the most critical and delicate part of the entire process. The company’s original RF generators were failing to provide the required stability, leading to poor uniformity across the wafer. By upgrading to the LAM 660-072825-200 (MKS LVF3527A), the company gained a new level of process control. The stable and repeatable RF output allowed for a perfectly uniform plasma, which in turn resulted in a consistent etch depth and a significant reduction in defects. The reliability and precision of this generator not only improved the final product quality but also reduced the scrap rate, providing a clear return on the investment.

Related Product Combination Solutions:

The LAM 660-072825-200 is a core component within a complex semiconductor tool, working in conjunction with:

• LAM Research Process Chamber: This is the vacuum chamber where the plasma etching or deposition process takes place. The RF power from the generator is delivered to the chamber electrodes.
• MKS/ENI RF Match Network: An external impedance matching network is essential to ensure that the maximum amount of RF power is transferred from the generator to the plasma load.
• Gas Delivery System: The process gases that are ionized by the RF energy are delivered to the chamber by a precise gas delivery system, often including mass flow controllers (MFCs).
• System Controller (PLC/PC): The main controller of the Lam Research tool sends the power and control commands to the 660-072825-200 and monitors its status via the communication interface.
• Vacuum Pumps: A robust vacuum pump system is required to maintain the high-vacuum conditions necessary for plasma processing.

Installation, Maintenance, and Full-Cycle Support:

The installation of the LAM 660-072825-200 must be performed by a qualified technician, as it involves high voltage, high frequency, and precise system integration. The unit’s design allows for a modular replacement, but proper setup and calibration are essential. Due to its robust construction and active cooling (air and water), routine maintenance is minimal. As a legacy component used in high-value capital equipment, availability can be a challenge. However, we provide comprehensive support by sourcing reliable, tested, and guaranteed-functional units from our specialized network. We offer technical assistance and expertise to ensure that your critical semiconductor fabrication tools remain operational and productive for as long as possible.