Name: CDX2000-0190-54753 COMDEL | runsheng
Brand: Other

Description

Description:

The CDX2000-0190-54753 is a high-performance dual-frequency RF power generator manufactured by Comdel, a subsidiary of XP Power. Designed for demanding semiconductor applications, this model delivers up to 2000W of power across two frequencies: 13.56 MHz and 2 MHz. It is commonly used in processes such as plasma etching, thin film deposition, and reactive ion etching (RIE), where precise and stable RF power is essential.

Application Scenarios:

In a semiconductor fabrication facility, the CDX2000-0190-54753 was integrated into the plasma etching system to enhance the precision of material removal during the wafer processing stage. The dual-frequency capability allowed for optimized etching profiles, leading to improved device performance and yield. Operators reported increased process stability and reduced downtime, attributing these improvements to the reliable and consistent RF power output of the CDX2000-0190-54753.

Parameters:

Parameter	Value/Description
Product Model	CDX2000-0190-54753
Manufacturer	Comdel (XP Power)
Product Category	Dual-frequency RF Generator
Output Power	2000W (1000W per frequency)
Frequencies	13.56 MHz and 2 MHz
Input Voltage	208V, 3-phase, 50/60Hz
Cooling Method	Forced air
Control Interface	Digital and analog inputs
Mounting Type	19-inch rackmount
Dimensions	3U height, 19-inch width
Weight	Approximately 15 kg
Environmental Rating	Industrial environments; IP20 protection

Technical Principles and Innovative Values:

Dual-frequency Operation: The CDX2000-0190-54753 provides simultaneous RF power at 13.56 MHz and 2 MHz, allowing for versatile applications in various semiconductor processes.
High Power Output: Delivers up to 2000W of RF power, ensuring adequate energy for demanding processes.
Advanced Control Features: Equipped with both digital and analog control interfaces, facilitating integration into automated systems.
Robust Design: Built to withstand industrial environments, ensuring longevity and reliability.
Efficient Cooling: Utilizes forced air cooling to maintain optimal operating temperatures, enhancing performance and lifespan.

Application Cases and Industry Value:

In a leading semiconductor foundry, the CDX2000-0190-54753 was employed to power the plasma etching chambers used in the fabrication of advanced logic devices. The dual-frequency capability enabled precise control over etching profiles, leading to improved pattern fidelity and device performance. The consistent RF power output contributed to reduced process variability, enhancing overall yield and throughput.

CDX2000-0190-54753 COMDEL