Description
Product Introduction
ENI 000-1134-076R is a 2 MHz OneBox OB1 RF generator used to supply high-frequency RF energy in semiconductor plasma processes, including etch, deposition, and related wafer-processing applications.
Available supplier records identify the unit as a 2.5 kW RF generator with 3-phase 208 V input for Lam Research applications. The model also appears in RF-generator repair databases, so buyers should verify whether the offered unit is New Original (New Surplus), Factory Sealed, or Refurbished (tested).
The 2.5 kW rating and 3-phase 208 V input appear in specialist cross-reference records for the related 000-1134-076 configuration. Confirm that the “R” suffix does not identify a different revision, interface, or tool-specific option.semivacintl
Do not assume the generator can connect directly to any 2 MHz matching network. Verify the RF output connector, control cable, interlock loop, reflected-power limits, and equipment recipe requirements before installation.
Installation & Configuration Guide
Phase 1—Pre-Installation — estimated 20 minutes
Shut down the process tool according to the approved semiconductor-equipment procedure. Isolate the 3-phase AC supply, RF output path, cooling system, and control interlocks. Wait at least 5 minutes for discharge, then verify zero energy with the Fluke 115 multimeter where the measurement category permits.
Prepare:
- ESD wrist strap and grounded ESD mat.
- Fluke 115 multimeter.
- CAT-rated insulated test leads.
- RF-rated cable inspection tools.
- Torque-controlled screwdriver.
- Approved schematics and interlock diagram.
- Generator configuration backup.
- Photographic record of cables, connectors, and switches.
Record the original part number, serial number, firmware, input wiring, RF cable routing, control-interface connections, cooling connections, and tool recipe. Photograph the nameplate, rear panel, RF connector, control connectors, and ground strap.
